EPM Architects Inc. — H1B Data for FY2015
FY2015 H1B Overview for EPM Architects Inc.
In fiscal year 2015, EPM Architects Inc. filed 9 H1B labor condition applications with the U.S. Department of Labor. Of these, 0 were certified and 0 were denied. The average salary offered on these applications was N/A.
The applications covered a total of 15 worker positions, as a single LCA can cover multiple workers in the same role and location.
According to USCIS data, EPM Architects Inc. had 2 initial H1B petitions approved and 0 denied in FY2015, resulting in an approval rate of 100.0%. The H1B approval process involves both DOL labor condition certification and USCIS petition adjudication.
View EPM Architects Inc.'s complete sponsorship history on the full employer profile, including all years, job titles, and salary trends. Learn more about the H1B visa program in our comprehensive H1B visa guide.
FY2015 H1B Filings by EPM Architects Inc.
Individual labor condition applications filed by EPM Architects Inc. in fiscal year 2015. There are 9 filings total.
| Case # | Status | Job Title | Salary | Location | Date |
|---|---|---|---|---|---|
| I-200-15079-043463 | Certified | SOFTWARE DEVELOPER | N/A | BELLAIRE, TX | 2015-03-26 |
| I-200-15079-350092 | Certified | SOFTWARE DEVELOPER | N/A | BELLAIRE, TX | 2015-03-26 |
| I-200-15079-745456 | Certified | SOFTWARE DEVELOPER | N/A | BELLAIRE, TX | 2015-03-26 |
| I-200-15054-044191 | Certified | SYTEMS ARCHITECT | N/A | BELLAIRE, TX | 2015-02-27 |
| I-200-15054-763903 | Certified | SYSTEMS ARCHITECT | N/A | BELLAIRE, TX | 2015-02-27 |
| I-200-15054-894786 | Certified | SYSTEMS ARCHITECT | N/A | BELLAIRE, TX | 2015-02-27 |
| I-200-15054-637377 | Withdrawn | SYSTEMS ARCHITECT | N/A | BELLAIRE, TX | 2015-02-23 |
| I-200-14282-710520 | Certified | EPM CONSULTANT | N/A | BELLAIRE, TX | 2014-10-16 |
| I-200-13312-996507 | Denied | EPM CONSULTANT | N/A | BELLAIRE, TX | 2014-10-08 |
EPM Architects Inc. H1B History by Year
Browse EPM Architects Inc.'s H1B filing data for other fiscal years.